Negative resists for i-line lithography utilizing acid-catalyzed intramolecular dehydration reaction.
| Autor: | Ueno, Takumi, Uchino, Shou-ichi, Hattori, Keiko T., Onozuka, Toshihiko, Shirai, Seiichiro, Moriuchi, Noboru, Hashimoto, Michiaki, Koibuchi, S. |
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| Zdroj: | Proceedings of SPIE; 11/ 1/1994, Issue 1, p173-181, 9p |
| Databáze: | Complementary Index |
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