Role of process in obtaining optimum lithographic information from chemically amplified resists.
| Autor: | Szmanda, Charles R., Fedynyshyn, Theodore H., Houck, William E., Root, Jonathan C., Blacksmith, Robert F. |
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| Zdroj: | Proceedings of SPIE; 11/ 1/1994, Issue 1, p269-284, 16p |
| Databáze: | Complementary Index |
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