Impact of attenuated mask topography on lithographic performance.
| Autor: | Ferguson, Richard A., Adair, William J., O'Grady, David S., Martino, Ronald M., Molless, Antoinette F., Grenon, Brian J., Wong, Alfred K. K., Liebmann, Lars W., Callegari, Alessandro, LaTulipe, Douglas C., Sprout, Donna M., Seguin, Christopher M. |
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| Zdroj: | Proceedings of SPIE; 11/ 1/1994, Issue 1, p130-139, 10p |
| Databáze: | Complementary Index |
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