Monitoring of highly selective plasma etch processes.
| Autor: | Maa, Jer-Shen, Allen, Lynn R., Evans, Dave, Hsieh, Tzu Y., Ulrich, Bruce D., Hsu, Sheng T., Grant, John M., Stecker, Greg |
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| Zdroj: | Proceedings of SPIE; 11/ 1/1994, Issue 1, p70-81, 12p |
| Databáze: | Complementary Index |
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