Thin-gate dielectric films grown in N2O and O2 using rapid thermal oxidation.
| Autor: | Grant, John M., Hsieh, Tzu Y., Shannon, Victoria L. |
|---|---|
| Zdroj: | Proceedings of SPIE; 11/ 1/1994, Issue 1, p253-264, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Grant, John M., Hsieh, Tzu Y., Shannon, Victoria L. |
|---|---|
| Zdroj: | Proceedings of SPIE; 11/ 1/1994, Issue 1, p253-264, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|