Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool.
| Autor: | Nguyen, Khanh B., Tichenor, Daniel A., Berger, Kurt W., Ray-Chaudhuri, Avijit K., Haney, Steven J., Nissen, Rodney P., Perras, Yon E., Arling, Richard W., Stulen, Richard H., Fetter, Linus A., Tennant, Donald M., White, Donald L., Wood II, Obert R. |
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| Zdroj: | Proceedings of SPIE; Nov1996, Issue 1, p54-62, 9p |
| Databáze: | Complementary Index |
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