New process for resist removal after lithography process using adhesive tape.
Autor: | Kubozono, Tatsuya, Moroishi, Yutaka, Ohta, Yoshio, Shimodan, Hideaki, Moriuchi, Noboru |
---|---|
Zdroj: | Proceedings of SPIE; Nov1996, Issue 1, p677-689, 13p |
Databáze: | Complementary Index |
Externí odkaz: |