New process for resist removal after lithography process using adhesive tape.

Autor: Kubozono, Tatsuya, Moroishi, Yutaka, Ohta, Yoshio, Shimodan, Hideaki, Moriuchi, Noboru
Zdroj: Proceedings of SPIE; Nov1996, Issue 1, p677-689, 13p
Databáze: Complementary Index