Efficient all-solid state 213-nm laser source for microlithography.
| Autor: | Kubota, Shigeo R., Wiechmann, Werner, Liu, Ling Yi, Oka, Michio, Kikuchi, Hiroki, Suganuma, Hiroshi, Masuda, Hisashi, Takeda, Minoru |
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| Zdroj: | Proceedings of SPIE; Nov1996, Issue 1, p841-846, 6p |
| Databáze: | Complementary Index |
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