Chemically amplified DUV photoresists using a new class of photoacid-generating compounds.
| Autor: | Pawlowski, Georg, Dammel, Ralph R., Lindley, Charlet R., Merrem, Hans-Joachim, Roeschert, Heinz, Lingnau, Juergen |
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| Zdroj: | Proceedings of SPIE; Nov1990, Issue 1, p16-25, 10p |
| Databáze: | Complementary Index |
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