PRIME process: an alternative to multiple layer resist systems and high accelerating voltage for e-beam lithography.
| Autor: | Tedesco, Serge V., Pierrat, Christophe, Vinet, Francoise, Florin, Brigitte, Lerme, Michel, Guibert, Jean C. |
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| Zdroj: | Proceedings of SPIE; Nov1990, Issue 1, p282-296, 15p |
| Databáze: | Complementary Index |
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