0.5-m photolithography using high-numerical-aperture I-line wafer steppers.
| Autor: | Arnold, William H., Minvielle, Anna Maria, Phan, Khoi A., Singh, Bhanwar, Templeton, Michael K. |
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| Zdroj: | Proceedings of SPIE; Nov1990, Issue 1, p127-142, 16p |
| Databáze: | Complementary Index |
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