Mask CD measurement approach by diffraction intensity for lithography equivalent.
| Autor: | Nagai, Takaharu, Mesuda, Kei, Sutou, Takanori, Inazuki, Yuichi, Hashimoto, Hiroyuki, Yokoyama, Toshifumi, Toyama, Nobuhito, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2008, Issue 1, p67920N-67920N-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|