Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions.
| Autor: | Houle, Frances A., Fornof, Ann, Miller, Dolores C., Raoux, Simone, Truong, Hoa, Simonyi, Eva, Jahnes, Christopher, Rossnagel, Stephen |
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| Zdroj: | Proceedings of SPIE; Nov2008, Issue 1, p69210B-69210B-6, 6p |
| Databáze: | Complementary Index |
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