Integration issues in step and repeat UV nanoimprint lithography.
| Autor: | Charpin-Nicolle, C., Irmscher, M., Pritschow, M., Vratzov, B., van Vossen, H., Chiaroni, J., Massin, J., Gubbini, P. |
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| Zdroj: | Proceedings of SPIE; Nov2008, Issue 1, p69212I-69212I-10, 10p |
| Databáze: | Complementary Index |
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