Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool.
| Autor: | Naulleau, Patrick P., Anderson, Christopher N., Chiu, Jerrin, Dean, Kim, Denham, Paul, Goldberg, Kenneth A., Hoef, Brian, Huh, Sungmin, Jones, Gideon, LaFontaine, Bruno M., Ma, Andy, Niakoula, Dimitra, Park, Joo-on, Wallow, Tom |
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| Zdroj: | Proceedings of SPIE; Nov2008, Issue 1, p69213N-69213N-11, 11p |
| Databáze: | Complementary Index |
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