Advanced profile control and the impact of sidewall angle at gate etch for critical nodes.
| Autor: | Lee, Hyung, Ranjan, Alok, Prager, Dan, Bandy, Kenneth A., Meyette, Eric, Sundararajan, Radha, Viswanathan, Anita, Yamashita, Asao, Funk, Merritt |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69220T-69220T-13, 13p |
| Databáze: | Complementary Index |
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