Opportunities and challenges for optical CD metrology in double patterning process control.
| Autor: | Wack, Daniel C., Hench, John, Poslavsky, Leonid, Fielden, John, Zhuang, Vera, Mieher, Walter, Dziura, Ted |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69221N-69221N-9, 9p |
| Databáze: | Complementary Index |
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