Phase metrology on 45-nm node phase-shift mask structures.

Autor: Lee, Kyung M., Tavassoli, Malahat, Buttgereit, Ute, Seidel, Dirk, Birkner, Robert, Perlitz, Sascha
Zdroj: Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69222A-69222A-6, 6p
Databáze: Complementary Index