Phase metrology on 45-nm node phase-shift mask structures.
Autor: | Lee, Kyung M., Tavassoli, Malahat, Buttgereit, Ute, Seidel, Dirk, Birkner, Robert, Perlitz, Sascha |
---|---|
Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69222A-69222A-6, 6p |
Databáze: | Complementary Index |
Externí odkaz: |