Novel approach for immersion lithography defectivity control to increase productivity.
| Autor: | Englard, Ilan, Stegen, Raf, Vanoppen, Peter, Minnaert-Janssen, Ingrid, der Kinderen, Ted, van Brederode, Erik, Duray, Frank, Linders, Jeroen, Ovchinnikov, Denis, Piech, Rich, Masia, Claudio, Hillel, Noam, Ravid, Erez, Rotlevi, Ofer, Wilde, Amir, Shabtay, Saar, Telor, Zach, Schreutelkamp, Robert |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69223U-69223U-10, 10p |
| Databáze: | Complementary Index |
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