Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography.
| Autor: | Saeki, Akinori, Kozawa, Takahiro, Tagawa, Seiichi, Cao, Heidi B., Deng, Hai, Leeson, Michael J. |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69230S-69230S-6, 6p |
| Databáze: | Complementary Index |
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