Advanced resist process enabling implementation of CD controllability for 32 nm and beyond.
| Autor: | Shimura, Satoru, Iwao, Fumiko, Kawasaki, Tetsu, Shannon, Dunn, Tanaka, Yoshitsugu, Yaegashi, Hidetami, Yamada, Yoshiaki |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69233C-69233C-6, 6p |
| Databáze: | Complementary Index |
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