Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography: Part II.
| Autor: | Nakayama, Osamu, Fukumoto, Takashi, Tachibana, Miki, Sato, Junko, Kitayama, Masahiko, Kajiyashiki, Tsuyoshi |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69233F-69233F-8, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|