Patterning strategy and performance of 1.3NA tool for 32nm node lithography.
| Autor: | Mimotogi, Shoji, Satake, Masaki, Kitamura, Yosuke, Takahata, Kazuhiro, Kodera, Katsuyoshi, Fujise, Hiroharu, Ema, Tatsuhiko, Sho, Koutaro, Ishigo, Kazutaka, Kono, Takuya, Asano, Masafumi, Yoshida, Kenji, Kanai, Hideki, Kyoh, Suigen, Harakawa, Hideaki, Nomachi, Akiko, Ishida, Tatsuya, Miyashita, Katsura, Inoue, Soichi |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69240M-69240M-9, 9p |
| Databáze: | Complementary Index |
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