Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns.
| Autor: | Kritsun, Oleg, La Fontaine, Bruno, Liu, Yongdong, Saravanan, Chandra S. |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69241M-69241M-9, 9p |
| Databáze: | Complementary Index |
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