Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography.
| Autor: | Kumazaki, Takahito, Suzuki, Toru, Tanaka, Satoshi, Nohdomi, Ryoichi, Yoshino, Masaya, Matsumoto, Shinichi, Kawasuji, Yasufumi, Umeda, Hiroshi, Nagano, Hitoshi, Kakizaki, Kouji, Nakarai, Hiroaki, Matsunaga, Takashi, Fujimoto, Junichi, Mizoguchi, Hakaru |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69242R-69242R-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|