High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography.
| Autor: | Yoshino, Masaya, Nakarai, Hiroaki, Ohta, Takeshi, Nagano, Hitoshi, Umeda, Hiroshi, Kawasuji, Yasufumi, Abe, Toru, Nohdomi, Ryoichi, Suzuki, Toru, Tanaka, Satoshi, Watanabe, Yukio, Yamazaki, Taku, Nagai, Shinji, Wakabayashi, Osamu, Matsunaga, Takashi, Kakizaki, Kouji, Fujimoto, Junichi, Mizoguchi, Hakaru |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69242S-69242S-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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