Uniaxial crystal last optical element for second- and third-generation immersion lithography.
Autor: | Sirat, Gabriel Y., Goldstein, Michael |
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Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69242T-69242T-10, 10p |
Databáze: | Complementary Index |
Externí odkaz: |