Combined mask and illumination scheme optimization for robust contact patterning on 45nm technology node flash memory devices.
| Autor: | Vaglio Pret, Alessandro, Capetti, Gianfranco, Bollin, Maddalena, Cotti, Gina, De Simone, Danilo, Cantù, Pietro, Vaccaro, Alessandro, Soma, Laura |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69243B-69243B-12, 12p |
| Databáze: | Complementary Index |
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