Improving lithography intra wafer CD for C045 implant layers using STI thickness feed forward?

Autor: Massin, Jean, Orlando, Bastien, Gatefait, Maxime, Chapon, Jean-Damien, Le-Gratiet, Bertrand, Minghetti, Blandine, Goirand, Pierre-Jérôme
Zdroj: Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69244M-69244M-7, 7p
Databáze: Complementary Index