Improving lithography intra wafer CD for C045 implant layers using STI thickness feed forward?
Autor: | Massin, Jean, Orlando, Bastien, Gatefait, Maxime, Chapon, Jean-Damien, Le-Gratiet, Bertrand, Minghetti, Blandine, Goirand, Pierre-Jérôme |
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Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69244M-69244M-7, 7p |
Databáze: | Complementary Index |
Externí odkaz: |