Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability.
| Autor: | Inazuki, Yuichi, Toyama, Nobuhito, Nagai, Takaharu, Sutou, Takanori, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya, Drapeau, Martin, Lucas, Kevin, Cork, Chris |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69251O-69251O-10, 10p |
| Databáze: | Complementary Index |
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