Model-based mask verification on critical 45nm logic masks.
| Autor: | Sundermann, F., Foussadier, F., Takigawa, T., Wiley, J., Vacca, A., Depre, L., Chen, G., Bai, S., Wang, J.-S., Howell, R., Arnoux, V., Hayano, K., Narukawa, S., Kawashima, S., Mohri, H., Hayashi, N., Miyashita, H., Trouiller, Y., Robert, F., Vautrin, F. |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p70280U-70280U-12, 12p |
| Databáze: | Complementary Index |
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