Mask CD compensation method using diffraction intensity for lithography equivalent metrology.
| Autor: | Nagai, Takaharu, Sutou, Takanori, Inazuki, Yuichi, Hashimoto, Hiroyuki, Toyama, Nobuhito, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p70281M-70281M-10, 10p |
| Databáze: | Complementary Index |
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