Mask and wafer cost of ownership (COO) from 65 to 22 nm half-pitch nodes.
| Autor: | Hughes, Greg, Litt, Lloyd C., Wüest, Andrea, Palaiyanur, Shyam |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p70281P-70281P-8, 8p |
| Databáze: | Complementary Index |
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