Optimization of measuring conditions for templates of UV nano imprint lithography.
| Autor: | Yoshida, Kouji, Kojima, Kouichirou, Abe, Makoto, Sasaki, Shiho, Kurihara, Masaaki, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p70281V-70281V-8, 8p |
| Databáze: | Complementary Index |
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