Comparison of TeraStar SL1, TeraScanHR DDR, DDT and SL2 to identify an efficient mask re-qualification inspection mode for 7Xnm half pitch design node production reticles in advanced memory wafer fab.
| Autor: | Kaneko, Koji, Kobayashi, Takanobu, Zhu, Jinggang, Takatsu, Norihiko, Yu, Paul, Ito, Kosuke, Kojima, Toshiaki, Nagaoka, Yoshinori |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p70282M-70282M-8, 8p |
| Databáze: | Complementary Index |
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