A novel lithography technique for formation of large areas of uniform nanostructures.
| Autor: | Wu, Wei, Dey, Dibyendu, Memis, Omer G., Katsnelson, Alex, Mohseni, Hooman |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p70390P-70390P-8, 8p |
| Databáze: | Complementary Index |
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