Low-loss HR coatings on fused silica substrates for 193 nm micro-lithography applications.
| Autor: | Laux, Sven, Bernitzki, Helmut, Fasold, Dieter, Klaus, Michael, Schuhmann, Uwe |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p71010Y-71010Y-5, 5p |
| Databáze: | Complementary Index |
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