An investigation of EUV lithography defectivity.
Autor: | Cummings, Kevin D., Laursen, Thomas, Pierson, Bill, Han, Sang-in, Watso, Robert, van Dommelen, Youri, Lee, Brian, Deng, Yunfei, La Fontaine, Bruno, Wallow, Thomas, Okoroanyanwu, Uzo, Wood, Obert, Tchikoulaeva, Anna, Holfeld, Christian, Peters, Jan Hendrick, Koay, Chiew-seng, Petrillo, Karen, DiBiase, Tony, Kini, Sumanth, Mizuno, Hiroyuki |
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Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p71222G-71222G-13, 13p |
Databáze: | Complementary Index |
Externí odkaz: |