Study of EUVL mask defect repair using FIB-GAE method.

Autor: Amano, Tsuyoshi, Nishiyama, Yasushi, Shigemura, Hiroyuki, Terasawa, Tsuneo, Suga, Osamu, Shiina, Kensuke, Aramaki, Fumio, Hagiwara, Ryoji, Yasaka, Anto
Zdroj: Proceedings of SPIE; Nov2008 Part 2, Issue 1, p71222H-71222H-8, 8p
Databáze: Complementary Index