Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner.
| Autor: | de Boeij, Wim, Dicker, Gerald, de Wit, Marten, Bornebroek, Frank, Zellenrath, Mark, Voorma, Harm-Jan, Smeets, Bart, Toussaint, Rene, Paarhuis, Bart, de Jong, Marteijn, Hellweg, Dirk, Kornitzer, Klaus |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p71401B-71401B-11, 11p |
| Databáze: | Complementary Index |
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