Low dislocation density GaN grown by MOCVD with SiNx nano-network.

Autor: Xie, J., Özgür, Ü., Fu, Y., Ni, X., Morkoç, H., Inoki, C. K., Kuan, T. S., Foreman, J. V., Everitt, H. O.
Zdroj: Proceedings of SPIE; Nov2007, Issue 1, p647304-647304-8, 8p
Databáze: Complementary Index