Microdischarge EUV source array and illuminator design for a prototype lithography tool.

Autor: Jurczyk, B. E., Stubbers, R. A., Alman, D. A., Hudyma, R., Thomas, M.
Zdroj: Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65170T-65170T-8, 8p
Databáze: Complementary Index