mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography.
| Autor: | Schuster, Christine, Kubenz, Mike, Reuther, Freimut, Fink, Marion, Gruetzner, Gabi |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65172B-65172B-11, 11p |
| Databáze: | Complementary Index |
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