Methodical approach to improve defect detection sensitivity on lithography process using DUV inspection system.

Autor: Lee, Changgoo, Won, Sera, Seo, Daeyoung, Kim, Hyeonsoo, Kim, Jinwoong, Yeo, Jeong-Ho, Dolev, Ido, Kwak, Chan-Hee
Zdroj: Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65182E-65182E-7, 7p
Databáze: Complementary Index