Methodical approach to improve defect detection sensitivity on lithography process using DUV inspection system.
Autor: | Lee, Changgoo, Won, Sera, Seo, Daeyoung, Kim, Hyeonsoo, Kim, Jinwoong, Yeo, Jeong-Ho, Dolev, Ido, Kwak, Chan-Hee |
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Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65182E-65182E-7, 7p |
Databáze: | Complementary Index |
Externí odkaz: |