Etch resistance: comparison and development of etch rate models.
| Autor: | Perret, Damien, Andes, Cecily E., Cheon, Kap-Soo, Sobhian, Mani, Szmanda, Charles R., Barclay, George G., Trefonas, Peter |
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| Zdroj: | Proceedings of SPIE; Nov2007, Issue 1, p651912-651912-12, 12p |
| Databáze: | Complementary Index |
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