Organic ArF bottom anti-reflective coatings for immersion lithography.
| Autor: | Xiang, Zhong, Zhuang, Hong, Wu, Hengpeng, Shan, Jianhui, Abdallah, Dave, Yin, Jian, Mullen, Salem, Yao, Huirong, Gonzalez, Eleazar, Neisser, Mark |
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| Zdroj: | Proceedings of SPIE; Nov2007, Issue 1, p651929-651929-10, 10p |
| Databáze: | Complementary Index |
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