A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography.
| Autor: | Mercado, Ramil-Marcelo L., Lowes, Joyce A., Washburn, Carlton A., Guerrero, Douglas J. |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65192X-65192X-10, 10p |
| Databáze: | Complementary Index |
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