The rational design of polymeric EUV resist materials by QSPR modelling.

Autor: Jack, Kevin, Liu, Heping, Blakey, Idriss, Hill, David, Yueh, Wang, Cao, Heidi, Leeson, Michael, Denbeaux, Greg, Waterman, Justin, Whittaker, Andrew
Zdroj: Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65193Z-65193Z-8, 8p
Databáze: Complementary Index