Modeling polarization for hyper-NA lithography tools and masks.
| Autor: | Lai, Kafai, Rosenbluth, Alan E., Han, Geng, Tirapu-Azpiroz, Jaione, Meiring, Jason, Goehnermeier, Aksel, Kneer, Bernhard, Totzeck, Michael, de Winter, Laurens, de Boeij, Wim, van de Kerkhof, Mark |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65200D-65200D-22, 22p |
| Databáze: | Complementary Index |
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