Immersion exposure tool for 45-nm HP mass production.
| Autor: | Kubo, Hiroaki, Hata, Hideo, Sakai, Fumio, Deguchi, Nobuyoshi, Iwanaga, Takehiko, Ebihara, Takeaki |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65201X-65201X-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|